摘要
The multi-bunch injection adopted at Shanghai Synchrotron Radiation Facility(SSRF) increases the injection rate greatly, with much less injection time than that of single bunch injection. It reduces massively the beam failure time during users' operation and prolongs the pulsed injection hardware lifetime. In this paper, the scheme to produce multi bunches for the RF electron gun is described. The filling result and beam orbit stability for top up operation is discussed.
The multi-bunch injection adopted at Shanghai Synchrotron Radiation Facility（SSRF） increases the injection rate greatly, with much less injection time than that of single bunch injection. It reduces massively the beam failure time during users’ operation and prolongs the pulsed injection hardware lifetime. In this paper, the scheme to produce multi bunches for the RF electron gun is described. The filling result and beam orbit stability for top up operation is discussed.
基金
Supported by National Natural Science Foundation of China(No.11105214)
