摘要
本文结合湿法腐蚀技术、紫外固化纳米压印技术、热压纳米压印技术制备出聚甲基丙烯酸甲酯(PMMA)沟槽微结构,基于局部加热的自封装技术成功制备出了PMMA微流控通道。研究了硅模板结构参数的选择要求以及工艺过程中实验参数对实验的影响。实验结果表明,热硅片与基片相对运动方向应与PMMA沟槽微结构方向平行,有利于制备出变形量小、尺寸均匀的微流控通道。
Poly methyl methacrylate (PMMA) grooved microstructure was fabricated using the technology of wet etching, UV nano-imprint lithography (UV-NIL) and hot embossing nano-imprint lithography (HE-NIL). PMMA microfluidic channel was successfully fabricated based on the local heating self-sealing technology. This paper presents the requirement of silicon template structure parameters and the effect of experimental parameters on the experiment. The experimental result indicates that, the relative speed direction between the substrate and the thermal silicon should be consistent with the direction of PMMA groove. This method is conducive to the fabrication of microfluidic channels with small deformation amount and uniform size.
出处
《真空》
CAS
2015年第6期70-73,共4页
Vacuum