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二氯二氢硅反歧化反应制备三氯氢硅工艺的研究 被引量:5

Study on Process of Trichlorosilane by Dichlorosilane Anti-disproportionation
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摘要 采用特定的催化剂,在反歧化精馏装置上由二氯二氢硅制备三氯氢硅。研究了物料配比、温度、压力、回流量等因素对二氯二氢硅转化率的影响。结果表明,当二氯二氢硅进料量为800 kg/h时,反歧化工艺操作的最佳工艺参数为:四氯化硅与二氯二氢硅的量之比为2∶1、塔釜温度90.5℃、反应床层温度78℃、塔顶温度48.5℃、塔顶压力为(85±0.5)k Pa、回流量为7 000 kg/h;此时,二氯二氢硅转化率可达95.4%。 The study investigated the process of trichlorosilane by treating dichlorosilane in anti- disproportionation distillation via special catalyst. Effects of ratio,temperature,pressure and flow on the conversion rate of dichlorosilane were studied. Results indicated the optimal conditions are at a feed rate of 800 kg / h dichlorosilane with the mole ratio of silicon tetrachloride and dichlorosilane at 2: 1 under 90. 5℃ at a reaction bed temperature of 78℃,overhead temperature of 48. 5℃,column top pressure of( 85 ± 0. 5) k Pa,and reflex load of 7 000 kg / h. Thus the conversion rate of dichlorosilane reached 95. 4%.
出处 《有机硅材料》 CAS 2015年第6期483-486,共4页 Silicone Material
关键词 二氯二氢硅 三氯氢硅 四氯化硅 反歧化 dichlorosilane trichlorosilane silicon tetrachloride antidisproportionation
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