摘要
以氢气和正硅酸乙酯为反应源,采用前驱体裂解的方法在硬质合金基体上制备非晶SiO2(a-Si O2)薄膜。X射线衍射(XRD)分析表明,非晶薄膜与基体发生反应,并在界面上形成硅钴化合物。此外,透射电镜(TEM)表征表明,该薄膜由微米级的空心球团状的非晶SiO2颗粒构成。随后,将非晶SiO2薄膜作为过渡层,采用热丝化学气相沉积技术在过渡层上沉积金刚石涂层。通过压痕试验表征制备获得的金刚石-非晶SiO2复合涂层对硬质合金基体的附着力。通过加工玻璃丝纤维增强塑料(GFRP)表征该复合涂层的切削性能。结果表明,非晶SiO2过渡层可以有效地改善金刚石涂层对硬质合金基体的附着力。此外,非晶SiO2过渡层的厚度对金刚石涂层附着力的提升效果有很大影响。
Amorphous Si O2(a-Si O2) films were synthesized on WC-Co substrates with H2 and tetraethoxysilane(TEOS) via pyrolysis of molecular precursor.X-ray diffraction(XRD) pattern shows that silicon-cobalt compounds form at the interface between a-Si O2 films and WC-Co substrates.Moreover,it is observed by transmission electron microscope(TEM) that the a-Si O2 films are composed of hollow mirco-spheroid a-Si O2 particles.Subsequently,the a-Si O2 films are used as intermediate films and chemical vapor deposition(CVD) diamond films are deposited on them.Indentation tests were performed to evaluate the adhesion of bi-layer(a-Si O2 + diamond) films on cemented carbide substrates.And the cutting performance of bi-layer(a-Si O2 + diamond) coated inserts was evaluated by machining the glass fiber reinforced plastic(GFRP).The results show that a-Si O2 interlayers can greatly improve the adhesive strength of diamond films on cemented carbide inserts;furthermore,thickness of the a-Si O2 interlayers plays a significant role in their effectiveness on adhesion enhancement of diamond films.
基金
Project(20130073110036)supported by the Research Fund for the Doctoral Program of Higher Education of China
关键词
热丝化学气相沉积法
金刚石薄膜
硬质合金
过渡层
附着力
hot filament chemical vapor deposition(HFCVD)
diamond film
WC-Co substrate
interlayer
adhesion