利用鳞片石墨热还原法制备石墨烯

Preparation of Graphene via Thermal Reduction of Flake Graphite

以天然鳞片石墨为原料,采用改进的Hummers法制备氧化石墨,再经热处理还原获得石墨烯。研究了热处理温度和碳酸氢铵的加入对氧化石墨还原的影响。结果表明:随着热处理温度从400℃升高到800℃,石墨烯的层间距由0.369 nm降低到0.335 nm,D峰与G峰强度比(ID/IG)值降低至0.89。在400℃添加碳酸氢铵后,石墨烯的层间距由0.369 nm降低为0.353nm,ID/IG值由0.96增大到1.06。

Oxidized graphite （GO） was prepared with natural flake graphite as a raw material by a modified Hummers method, andthe graphene was subsequently prepared by thermal reduction of the oxidized graphite. The influences of heat treatment temperatureand ammonium bicarbonate on the reduction of GO were investiagted. The results show that the layer spacing of graphene decreasesfrom 0.369 to 0.335 nm, and the ID/IG value correspondingly decreases to 0.89 as the heat treatment temperature increases from 400 to800℃. The layer spacing of graphene decreases from 0.369 to 0.353 nm when ammonium bicarbonate is added at 400℃, leading tothe increase of ID/IG value from 0.96 to 1.06.