X射线荧光光谱法快速测定FeSiB非晶合金薄带中硅、硼、铁

Rapid Determination of Silicon,Boron and Iron in FeSiB Amorphous Alloy Film by X-ray Fluorescence Spectrometry

提出了以自制的标准样品,采用单点法绘制校准曲线,利用X射线荧光光谱仪测定FeSiB非晶薄带样品中硅、硼和铁的含量。对于4个FeSiB非晶合金薄带样品中硅、硼和铁进行了10次测定,其分析结果的相对标准偏差分别为0.4%~0.5%、1.3%~4.2%和0.2%~0.4%。方法的分析结果与火花源原子发射光谱法、化学重量法和电感耦合等离子体原子发射光谱（ICP-AES）法的测定值吻合较好。方法快速、简便,薄带样品无需制样,适用于FeSiB非晶合金薄带的快速成分分析。

With self-made standard samples and single point method for drawing calibration curves,a method for the determination of silicon,boron and iron in FeSiB amorphous alloy film by X-ray fluorescence spectrometry was proposed.Under the optimum analytical conditions,the contents of silicon,boron and iron in four FeSiB amorphous alloy film samples were determined.The relative standard deviations（RSDs,n=10）for silicon,boron and iron were 0.4% ~0.5%,1.3% ~4.2% and 0.2% ~0.4%,respectively.The analytical results obtained by the proposed method were in good accordance with those obtained by spark source atomic emission spectormetry,chemical gravimetric method and ICP-AES.The method is rapid,simple without film sample preparation.Therefore,it can be used for the component analysis in FeSiB amorphous alloy film samples.