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碱性清洗液中pH值对苯并三氮唑去除效果的影响 被引量:1

Effect of the pH Value in Alkaline Cleaning Solution on Benzotriazole Removal
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摘要 主要在以碱性螯合剂去除苯并三氮唑(BTA)的基础上,通过改变清洗液的pH值来研究螯合剂对BTA去除效果的影响。BTA会和铜在其表面生成一层致密的Cu-BTA膜,使铜的表面疏水。利用这一特性,通过铜表面接触角大小的变化来判断BTA的去除效果。利用电化学工作站,在螯合剂与BTA的混合溶液作为电解质的条件下,得出铜电极的塔菲尔曲线来验证接触角的测试结果。结果表明,随着pH值的增加,在pH值为7~10时,对BTA的去除有很明显的促进作用。当pH值大于10后,促进作用不明显。 Based on benzotriazole(BTA)removed by the alkaline chelating agent,the effect of the chelating agent on the BTA removal result was studied by changing the pH values of the cleaning solution.The BTA forms a layer of the compact Cu-BTA film with copper on the surface,leading to a hydrophobic surface of copper.Based on the characteristics,the BTA removal result was determined by the change of the contact angles of the copper surface.By using the electrochemical workstation,the Tafel curve of the copper electrode in the mixed electrolyte with chelating agent and BTA was obtained to verify the test results of the contact angles.The results show that the increase of the pH value obviously promotes the BTA removal in the pH values of7-10,and the promotion effect is not obvious while pH value is greater than 10.
出处 《微纳电子技术》 北大核心 2015年第12期811-814,744,共4页 Micronanoelectronic Technology
基金 国家中长期科技发展规划02科技重大专项资助项目(2009ZX02308-003 2014ZX02301003-007)
关键词 CMP后清洗 碱性螯合剂 苯并三氮唑(BTA) 接触角 电化学 post-CMP cleaning alkaline chelating agent benzotriazole(BTA) contact angle electrochemistry
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