期刊文献+

InN_(0.01)Sb_(0.99)薄膜的红外反射光谱及探测特性和退火的影响 被引量:1

Far-infrared reflectance spectra and photoelectric characteristics of InN_(0.01)Sb_(0.99) thin films and the annealing effects
下载PDF
导出
摘要 对基于GaAs失配衬底的新型红外探测材料InN_(0.01)Sb_(0.99)薄膜的远红外反射光谱,以及制备成光电导器件后的黑体响应和光电流谱进行了测试,获得了80 K温度下,响应峰值约为4.4μm、半高宽约为3.5μm、截止波长约为5.7μm的中波宽带响应红外探测原型器件.研究了退火对In N_(0.01)Sb_(0.99)薄膜光电导器件性能的影响,发现退火能够改善晶体质量,提高器件的响应能力,并减小Moss-Burstein效应的影响. The far-infrared reflectance spectra and the infrared detection characteristics of the newinfrared material of InN_0.01Sb_0.99 thin films were reported. Far-infrared reflectance spectra,blackbody photoresponses and photocurrent spectra of the lattice mismatched InN_0.01Sb_0.99 film on Ga As substrate have been measured. A prototype wide-band infrared detector whose response peak at 4.4 μm and cut-off wavelength at 5.7 μm with the FWHM of 3.5 μm has been obtained. By investigating the annealing effects on the device performance,it is found that the crystal quality and the response capability are improved and the M oss-Burstein effect is reduced after annealing.
出处 《红外与毫米波学报》 SCIE EI CAS CSCD 北大核心 2015年第4期437-441,共5页 Journal of Infrared and Millimeter Waves
基金 国家重点基础研究发展计划(2011CB922004) 国家自然科学基金(61376053 61405231)~~
关键词 InNSb薄膜 红外反射光谱 红外探测器 退火 InNSb film far-infrared reflectance spectra infrared detector annealing
  • 相关文献

参考文献15

  • 1Shah W, Walukiewicz W, AGER J W, et al. Band Anti- crossing in GaInNAs Alloys [ J ]. Physical Review Letters, 1999, 82(6) : 1221-1224.
  • 2Veal T D, Mahboob I, Meconville C F. Negative band gaps in dilute InNSbl. alloys [ J]. Physical Review Letters, 2004, 92(13) : 136801.
  • 3LINDSAY A, O' REILLY E P, ANDREEV A D, et al. Theory of conduction band structure of InNxSbl_x and GaNxSbi. dilute nitride alloys [J]. Physical Review B, 2008, 77(16) : 165205.
  • 4Murdin B N, Kamal-Saadi M, Lindsay A, et al. Auger re- combination in long-wavelength infrared InNxSbl-x alloys [ J]. Applied Physics Letters, 2001,78( 11 ) : 1568-1570.
  • 5Chen X Z, Wang Y, Zhang D H, et al. InSbN junction di- ode fabricated by ion implantation [ C ]. In PhotonicsGlobal @Singapore, 2008. IPGC 2008. 1EEE, 2008:8-11.
  • 6Chen X Z, Zhang D H, Liu W, et al. Narrow band gap InSbN films fabricated by two-step ion-implantation for long wavelength infrared photodetection [ C ]. In Photonics and Optoelectronic ( SO PO ) , 2010 Symposium on, 2010 : 19-21.
  • 7Osamura K, Naka S, Murakami Y. Preparation and optical properties of Gal. InS N thin films [ J ]. Journal of Applied Physics, 1975, 46(8) : 3432-3437.
  • 8李志锋,几种半导体功能材料的光谱研究,中国科学院上海技术物理研究所博士论文,2000.
  • 9Mahboob I, Veal T D, Mcconville C F. Electron dynamics in InNSb.[ J], Applied Physics Letters, 2003, 88( 11 ) : 2169-2171.
  • 10Mahboob, Veal T D, Mcconville C F. Low-energy nitrogen ion implantation of InSb [ J ]. Journal of Applied Physics, 2004, 96(9): 4935-4938.

二级参考文献8

  • 1Reibel Y, Rubaldoa L, Vaza C, et al. MCT (HgCdTe) IR detectors: latest developments in France[J]. Proc. of SPIE, 2010, 7834: 78340M - 1.
  • 2Rogalski A, AntoszewskiJ, Faraone 1. Third-generation in?frared photodetector arrays[J].JOURNAL OF APPLIED PHYSICS, 2009, 105(09): 091101 -1.
  • 3Rogalski A. New material systems for third generation infra?red detectors[J]. SPIE, 2009, 7388: 73880J - 1.
  • 4Park B A, Musca C A, AntoszewskiJ, et al. Effect of high?density plasma process parameters on carrier transport prop?erties in p-to-n type converted HgO. 7CdO. 3Te Layer] J].]. Electron. Mater. , 2007 , 36 ( 8) : 913.
  • 5Haakenaaen R, Colin T, Steen H, et al. Electron beam in?duced current study of ion beam milling type conversion in molecular beam epitaxy vacncy-doped CdxHg,ox Te[J].Journal of Electronic Materials, 2000, 29 (6) : 849 - 852.
  • 6Musca C A, SiliquintJ F, Smith E P G , et al. Laser beam induced current image of reactive ion etching induced n-type doping in HgCdTe[J].Journal of Electronic Materials, 1998,27 (6) :661 - 667.
  • 7叶振华,周文洪,胡伟达,胡晓宁,丁瑞军,何力.碲镉汞红外双色探测器响应光谱研究[J].红外与毫米波学报,2009,28(1):4-7. 被引量:9
  • 8叶振华,尹文婷,黄建,胡伟达,陈路,廖亲君,陈洪雷,林春,胡晓宁,丁瑞军,何力.128×128短波/中波双色红外焦平面探测器[J].红外与毫米波学报,2010,29(6):415-418. 被引量:10

共引文献5

同被引文献9

引证文献1

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部