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硫酸铈与硫酸铜对化学镀镍的影响 被引量:4

Influences of Ce(SO_4)_2 and CuSO_4 on Electroless Nickel Plating
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摘要 以反应活化能、镀速、镀层中磷的质量分数和镀层光泽度为评价指标,研究了Ce(SO_4)_2和CuSO_4对柠檬酸体系化学镀镍的影响。结果表明:添加Ce(SO_4)_2和CuSO_4均能降低反应体系的活化能;将50mg/L Ce(SO_4)_2和7.5mg/L CuSO_4进行复配,镀速达到15.427 6μm/h,镀层中磷的质量分数为10.58%,镀层光泽度为228Gs。 Influences of Ce(SO4)2 and CuSO4 on citric acid system electroless nickel plating were investigated selecting reaction activation energy, plating rate, phosphorus mass fraction in coating and coating glossiness as evaluation index. Results showed that Ce(SO4)2 and CuSO4 can lower the reaction activation energy. Furthermore, under the conditions of Ce(SO4)2 50 mg/L and CuSO4 7. 5 mg/L, the plating rate reached up to 15. 427 6 μm/h, the phosphorus mass friction in coating was 10.58% and the coating glossiness was 228 Gs.
出处 《电镀与环保》 CAS CSCD 北大核心 2016年第1期27-30,共4页 Electroplating & Pollution Control
关键词 化学镀镍 镀速 镀层中磷的质量分数 镀层光泽度 electroless nickel plating plating rate glossiness phosphorus mass fraction in coating coating
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