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基于卷对卷矩形靶的溅射膜厚均匀性控制

Thickness Uniformity Control of Sputtered Film Based on Roll-to-Roll System with a Rectangular Target
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摘要 提出一种基于卷对卷矩形靶的溅射理论模型,借助Matlab模拟仿真软件,对卷绕柔性衬底(宽度为100 mm,弯曲半径为100 mm,弯曲角为80°)的膜厚均匀性进行分析.首先,在主辊静态条件下,改变靶材几何尺寸和靶基距,研究此时膜厚均匀性误差的分布情况,发现:膜厚均匀性误差随着靶材几何尺寸的变大而整体减小;随着靶基距的增大,均匀性误差的中部先增大后减小,而两边一直减小.其次,在主辊动态条件下,固定靶材几何尺寸,仅改变靶基距,研究此时膜厚均匀性误差的分布规律,发现:随着靶基距的增大,膜厚均匀性误差先增大后减小.仿真实验结果还表明,动态膜厚均匀性误差位于静态膜厚均匀性误差分布曲线Max-Min的中部极值点与该分布曲线上参考点均值之间.通过对文中模型的仿真,可以较快地预测基于卷对卷矩形靶的动态膜厚均匀性误差范围,大大减少膜厚均匀性的实验调试次数. In this paper,a sputtered theoretical model is proposed on the basis of the roll-to-roll system with a rectangular target,and with the help of the simulation software Matlab,it is used to analyze the film thickness uniformity of the rolled flexible substrate,whose width is 100 mm with a bending radius of 100 mm and a bending angle of80°. First,in the stillness of main roller,the situation of the film thickness uniformity error is investigated by adjusting the geometry size of target and the substrate-to-target distance. The results show that the film thickness uniformity error as a whole decreases with the increase of the geometry size of target,and that as the substrate-to-target distance increases,the middle parts of the film thickness uniformity error first increase and then decrease,while both sides of the film thickness uniformity error decrease. Next,in the rolling condition,the distribution of the film thickness uniformity error is discussed by adjusting the substrate-to-target distance and keeping a constant geometry size of target. It is found that the film thickness uniformity error first increase and then decrease as the substrate-totarget distance increases. Simulaiton results also show that the rolling film thickness uniformity error locates between the middle maximum of the stilling film thickness uniformity error distribution curve Max-Min and the average of the reference points on this distribution curve. Through the simulation of the proposed model,the rolling film thickness uniformity error on the basis of the roll-to-roll system with a rectangular target can be predicted quickly and the number of debugging can be reduced significantly.
出处 《华南理工大学学报(自然科学版)》 EI CAS CSCD 北大核心 2015年第11期81-86,共6页 Journal of South China University of Technology(Natural Science Edition)
基金 广东省战略性新兴产业核心技术攻关项目(2012A032300009) 华南理工大学中央高校基本科研业务费专项资金资助项目(2014ZM0025)~~
关键词 矩形靶 卷对卷 真空磁控溅射 膜厚均匀性 仿真 rectangular target roll-to-roll vacuum magnetron sputtering film thickness uniformity simulation
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