摘要
采用反应磁控溅射的方法,利用Zr靶与TiSi复合靶成功制备了不同TiSiN层厚度的ZrN/TiSiN纳米多层膜。利用X射线衍射(XRD)、高分辨透射电子显微镜(HRTEM)、扫描电子显微镜(SEM)和纳米压痕仪研究了不同TiSiN层厚度对ZrN/TiSiN纳米多层膜的微观结构和力学性能的影响。结果表明,ZrN/TiSiN纳米多层膜主要由面心立方的ZrN相组成,随着TiSiN层厚度的增加,纳米多层膜的结晶程度先增加后降低,其硬度和弹性模量也先升高后降低。当TiSiN层厚度为0.7nm时,纳米多层膜具有最高的硬度和弹性模量,分别为28.7和301.1GPa,远超过ZrN单层膜。ZrN/TiSiN纳米多层膜的强化效果可由交变应力场和模量差理论进行解释。
This paper adopts the method of magnetron sputtering with using Zr target and TiSi composite target to get the successful preparation of different TiSiN layer thickness of ZrN/TiSiN nanometer multilayer films.Using X-ray diffraction(XRD),scanning electron microscope(SEM),high-resolution transmission electron microscopy(HRTEM)and nano indentation tester and other test methods to study the impact of different TiSiN layer thickness on the ZrN/TiSiN nanometer multilayer films of microstructure and mechanical properties.The results showed that with the increase of TiSiN layer thickness the coating is mainly composed of the ZrN face-centered cubic phase,ZrN phase crystallization degree increased before they are reduced and the hardness of coating increased before they are reduced.When TiSiN thickness was 0.7nm the coating had the highest hardness and elastic modulus(28.73,301.125GPa)that far more than ZrN monolayer film hardness.Strengthening effect of ZrN/TiSiN nanometer multilayer films can be made of Alternating stress field and modulus of differential theory to explain.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2016年第1期1038-1042,共5页
Journal of Functional Materials
基金
国家自然科学基金资助项目(51471110
51101101)