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HFCVD硼掺杂复合金刚石薄膜的机械性能研究 被引量:1

Investigation on mechanical property of HFCVD boron-doped composite diamond film
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摘要 综合不同种类单层金刚石薄膜的典型优点制备的复合金刚石薄膜具有优异的综合性能,本研究对比了UMCD、BDMCD、UFGD和两类新型硼掺杂复合金刚石薄膜的机械性能。研究结果表明:硼掺杂技术可有效改善金刚石薄膜的附着性能,因此BDM-UMCD和BDM-UM-UFGCD薄膜均具有较好的附着性能;表层为UMCD薄膜的BDM-UMCD薄膜(84.354GPa)具有UMCD薄膜(82.058GPa)表面硬度极高的优点,但是表面粗糙度较高(Ra304.41nm)、表面可抛光性较差;相比之下,表层为UFGD薄膜的BDM-UM-UFGCD薄膜则具有UFGD薄膜优异的表面光洁度(Ra104.71nm)和表面可抛光性,此外由于硬度极高的中间层UMCD对于表层硬度的补充作用,该复合薄膜还具有相比于单层UFGD薄膜(67.925GPa)而言较高的表面硬度(72.657GPa)。 The composite diamond films combining typical merits of different types of monolayer diamond films show excellent comprehensive performance.In this article,mechanical properties of UMCD,BDMCD,UFGCD and two novel boron-doped composite diamond films were respectively evaluated and compared.Research results showed that the boron doping technology could significantly improve the film-substrate adhesion,so BDM-UMCD and BDM-UM-UFGCD films both presented favorable adhesive strength. The surface layer of the BDM-UMCD film was UMCD layer,consequently,such the composite film had extremely high surface hardness(84.354GPa)similar to the monolayer UMCD film(82.058 GPa),relatively high surface roughness(Ra304.41nm)and bad polishability.By contrast,the BDM-UM-UFGCD film with the UFGD layer as the surface performed nice surface smoothness(Ra104.71nm)and polishability,as well as relatively higher surface hardness(72.657GPa)than the monolayer UFGD film(67.925GPa)attributed to the reinforcement effect of the ultra-hard middle UMCD layer.
出处 《金刚石与磨料磨具工程》 CAS 2015年第6期8-13,18,共7页 Diamond & Abrasives Engineering
基金 国家自然科学基金项目(项目编号51275302 51375011)
关键词 HFCVD 硼掺杂 金刚石薄膜 机械性能 HFCVD boron doping diamond film mechanical property
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