摘要
采用常温直流磁控溅射法在201无镍不锈钢表面沉积了纯钛薄膜。XRD分析表明,薄膜是六方金属钛结构,并且膜相数量受沉积条件的影响。钛薄膜一般具有高度的择优取向,但其择优取向的晶面并不固定,也会出现多个晶面择优生长现象。个别工艺参数下,由于钛原子的渗入,基底发生较严重的晶格畸变。利用拉脱法评估了负偏压对钛膜与201基底附着强度的影响。
Ti film was deposited at the room temperture by DC magnetron sputtering on Ni-free 201 stainless steel. XRD results show that the film is Ti with hexagonal structure and the quantity of film phase is affected by sputtering parameters. Ti film is highly orientational but lattice plane with the orientation is not exclusive with defferent variable process parameters and the orientation of several planes is observed too. It is also determined by XRD that the more serious lattice distortion of the base happens because of Ti atom infiltration. Moreover, it is evaluated by pulling-open method for the adhesive strength between Ti film and 201 base affected by DC bias.
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2011年第S2期409-412,共4页
Rare Metal Materials and Engineering
基金
四川省科技支撑计划(2008GZ0188)
关键词
201无镍不锈钢
磁控溅射
钛薄膜
择优取向
附着强度
Ni-fress201 stainless steel
magnetron sputtering
Ti film
orientation
adhesive strength
