掺Nb浓度对溶胶凝胶法制备TiO_2薄膜透明导电性的影响（英文）

Effect of Nb Doping Concentration on Transparent Conductivity of TiO_2 Films Fabricated by Sol-Gel Method

采用溶胶凝胶(sol-gel)法制备出不同Nb掺杂浓度的Nb:TiO_2薄膜,再经过后续H2退火提高结晶性能。用X射线衍射(XRD),X射线光电子谱(XPS),扫描电子显微镜(SEM),霍尔仪和紫外可见分光光度计检测分析样品的形貌和性能,其中包括结晶性能、元素价态、电学性能和透过率。结果显示,掺Nb的TiO_2薄膜的导电率随Nb浓度的增加而降低,当掺Nb浓度为8%时,样品具有最优异的性能,其方块电阻可以达到约4.2×104?/□,透过率高达70%左右。

Nb doped TiO_2 films(TNO) were fabricated by a sol-gel method and then subjected a post-annealing process in H2. X-ray diffraction(XRD), X-ray photoelectron spectroscopy(XPS), scanning electron microscope(SEM) and Hall measurement were applied to investigate the structure, crystallization, composition, conductivity and transmitivity of the films. The results show that the conductivities of TNO films decrease with Nb atom concentration increasing after post-annealing. The lowest square resistance of the TNO films is determined to be ~ 4.2×104 ?/□ in Nb0.08:Ti0.92O_2, and the transmitivity reaches up to 70%.