摘要
A pseudoplastic metal nanoparticle fluid (PMNF) is used in nanoimprint to fabricate semiconductors and func- tional devices. The evaporation of the solvent and the sintering of the Au PMNF are investigated. The key parameters, which influence the morphology of patterning, such as the radius of metal particles, the concentra- tion of metal particles, the Hamaker constant of the solvent, viscosity of the fluids and the evaporation velocity, are analyzed. Based on a two-sphere sintering model, the equations are derived, which represent the relationships between the relative shrinkage and radius of the metal particles, sintering temperature and time. The optimal parameters for the heat treatment are provided in nanoimprint.
A pseudoplastic metal nanoparticle fluid (PMNF) is used in nanoimprint to fabricate semiconductors and func- tional devices. The evaporation of the solvent and the sintering of the Au PMNF are investigated. The key parameters, which influence the morphology of patterning, such as the radius of metal particles, the concentra- tion of metal particles, the Hamaker constant of the solvent, viscosity of the fluids and the evaporation velocity, are analyzed. Based on a two-sphere sintering model, the equations are derived, which represent the relationships between the relative shrinkage and radius of the metal particles, sintering temperature and time. The optimal parameters for the heat treatment are provided in nanoimprint.
基金
Supported by the National Natural Science Foundation of China under Grant Nos 51175479 and 51475436
the Education Department of Henan Province under Grant Nos 13A460725 and 2013GGJS-001