包含等离子体辅助沉积参数和离子刻蚀作用过程的结构区域相图

A Structure Zone Diagram Including Plasma-based Deposition and Ion Etching

文中提出一种扩展的薄膜微观结构的区域相图,可以用其来表征过滤阴极弧以及高功率脉冲磁控溅射镀膜过程中含有大量离子流的动态沉积过程。其坐标轴包括广义同系温度,标量化动能以及可以表征离子刻蚀作用的净膜厚。需要强调的是,由于影响薄膜生长的实际参数要远超相图中有限的坐标轴数,因此该结构区域相图展示的生长条件与薄膜结构之间的关系是近似和简化过的。

An extended structure zone diagram is proposed that includes energetic deposition,characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high power impulse magnetron sputtering.The axes are comprised of a generalized homologous temperature,the normalized kinetic energy flux,and the net film thickness,which can be negative due to ion etching.It is stressed that the number of primary physical parameters affecting growth by far exceeds the number of available axes in such a diagram and therefore it can only provide an approximate and simplified illustration of the growth condition-structure relationship.