化学气相沉积石英玻璃工艺数值模拟

Numerical Simulation of Chemical Vapor Deposition for Silica Glass

为提高某型号立式化学气相沉积炉生产大尺寸高纯度石英玻璃过程中石英玻璃沉积体表面的温度分布均匀性,从而提高其光学性能,对立式沉积炉内石英玻璃的生产过程中温度场和速度场的分布情况进行了数值模拟。通过调整燃烧器的结构,对沉积炉原有模型进行了进一步的改进优化。结果表明改进了的燃烧器型式可以有效地消除偏峰现象,提高表面温度分布的均匀性。

To improve the property of high purity large silica glass produced by Vertical CVD deposition furnace, the temperature and velocity field in the furnace were simulated. The original model of the burn- er was modified. The simulation results show that the modified burner can move the peak temperature val- ue to the middle of sedimentary- bodies. Thus, the uniformity of temperature distribution in the surface of the sedimentary body can be improved.