期刊文献+

清洗工艺对金属辅助刻蚀制备黑硅及其光伏器件的影响

Influence of Cleaning Process on Metal-Assisted Etching Black Silicon and Its Photovoltaic Device
下载PDF
导出
摘要 为了减少黑硅表面缺陷对黑硅太阳电池性能的影响,本文以金属纳米颗粒辅助刻蚀制备的156 mm×156 mm多晶黑硅为研究对象,分别采用传统RCA清洗工艺中SC1清洗方法及其改进方法清洗黑硅,并通过SEM、少子寿命、IV、QE等手段表征黑硅微观结构及其光伏器件电性能。结果表明:改进清洗方法比SC1具有更好的清洗效果,能够有效去除黑硅中的金属残留,同时修正黑硅表面微结构,黑硅的少子寿命由1.98μs提高到3.09μs。对于156mm×156mm多晶黑硅太阳电池,改进方法清洗的黑硅电池比SC1方法清洗黑硅太阳电池短路电流提升62m A,平均转化效率提升了0.16%,达18.01%。 To reduce the effect of black silicon surface defect on black silicon solar cell performance,two methods of cleaning the 156 mm × 156 mm muti-crystaline black silicon prepared by metal nano particles assisted etching are studied. The SC1 cleaning method in traditional RCA process for semiconductor industry and an optimized method are used to clean the black silicon. The black silicon microstructure or the electrical properties of its photovoltaic device were characterized by SEM,minority carrier life time,I~ V and QE. The results show that,comparing with the SC1 method,the optimized cleaning method is more effective to removing the metal residue in the black silicon and modifying the surface microstructure of the black silicon,and increase the minority carrier lifetime from 1. 98μs to 3. 09μs. And the optimized method have a 62 m A increase on short circuit current as well as a 0. 16% increase on average conversion efficiency for the 156 mm × 156 mm muti-crystaline black silicon solar cells with 18. 01% average conversion efficiency.
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2016年第2期371-375,共5页 Journal of Synthetic Crystals
基金 中小企业发展专项资金(SQ2013ZOC100014)
关键词 黑硅 清洗工艺 少子寿命 太阳电池 black silicon cleaning method minority carrier life time solar cell
  • 相关文献

参考文献1

二级参考文献22

  • 1孙静,康琳,刘希,赵少奇,吉争鸣,吴培亨,郝西萍.反应离子刻蚀与离子刻蚀方法的研究与比较[J].低温物理学报,2006,28(3):224-227. 被引量:4
  • 2Her TH,Finlay RJ,Wu C,et al.Microstructuring of silicon with femtosecond laser pulses. Applied Physics . 1998
  • 3JINGTAO ZHU,et al.Great enhancement of infrared light absorption of siliconsurface-structured by femtosecond laser pulse in N2ambient. Materials. Letters . 2006
  • 4VOROBYEV A Y,GUO C.Direct creation of black silicon using femtosecondlaser pulses. Applied Surface Science . 2011
  • 5Peng K,Lu A,Zhang R, et al.Motility of metal nanoparticles in silicon and inducedanisotropic silicon etching. Advanced Functional Materials . 2008
  • 6Kensuke Nishioka,Susumu Horita,Keisuke Ohdaira,Hideki Matsumura.Antireflection subwavelength structure of silicon surface formed by wet process using catalysis of single nano-sized gold particle. Solar Energy Materials . 2008
  • 7Yingli Cao,Aimin Liu,Honghao Li et al.Fabrication of silicon wafer with ultra low reflectance by chemical etching method. Applied Surface Science . 2011
  • 8Franz Laermer,Andrea Schilp.Method of anisotropic etching of silicon. United States:09/328,019 . 1999
  • 9Yoo J.Reactive Ion Etching (RIE) Technique for Application in CrystallineSilicon Solar Cells. Solar Energy . 2010
  • 10J. S. Yoo,I. O. Parm,U. Gangopadhyay, et al.Black silicon layer formation for application in solar cells. Solar Energy Materials . 2006

共引文献6

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部