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溶剂沸点对旋涂Rubrene薄膜性能的影响

Effects of Solvent Boiling Point on the Properties of Spin-Coated Rubrene Thin Films
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摘要 研究了溶剂沸点对溶液法制备Rubrene薄膜特性的影响。使用苯甲醚、氯苯、甲苯和氯仿等溶剂旋涂制备了Rubrene薄膜,并使用椭偏仪对其光学参数进行研究,采用空间电荷限制电流法获得薄膜电学特性。当使用高沸点的苯甲醚作溶剂时,获得的Rubrene薄膜迁移率为1.58×10-5 cm2/(V·s),薄膜折射率最大,薄膜均一性和致密性较好,粗糙层厚度最小,仅为11.92nm;而采用低沸点的氯仿作溶剂时,获得的Rubrene薄膜迁移率仅为1.07×10-10 cm2/(V·s)。研究结果表明,溶剂的沸点对Rubrene薄膜特性有较大影响,高沸点的溶剂容易获得性能优良的薄膜。 The effects of solvent boiling point on the properties of Rubrene thin films manufactured by solutionprocess method was studied,and the Rubrene thin films were obtained by spin coating with anisole,chlorobenzene,toluene,and chloroform as solvent respectively.Firstly,spectroscopic ellipsometry was used to study the optical parameters of Rubrene thin films.The results indicated that by using high boiling point anisole as solvent,the film refractive index was the largest and the surface roughness of the film decreased to only 11.92 nm,of course,good film uniformity and density were also achieved.Secondly,the space charge limited current method was used to gain electrical properties.The mobility of Rubrene thin films was 1.58×10^-5 cm^2/(V·s)when using anisole as solvent,and was only 1.07×10^-10 cm^2/(V·s)when using low boiling point solvent chloroform.The results showed that the boiling point of solvent had a great influence on the characteristics of Rubrene thin films,and high boiling point solvent could be used to obtain high performance thin films.
出处 《微电子学》 CAS CSCD 北大核心 2016年第1期136-140,共5页 Microelectronics
基金 国家自然科学基金资助项目(60776056)
关键词 RUBRENE 空间电荷限制电流 溶剂沸点 椭偏光谱 Rubrene Space charge limited current Solvent boiling point Spectroscopic ellipsometry
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