基于双平面方式下陶瓷球抛光均匀性研究

Study on polishing uniformity of using dual-plane process method for finishing ceramics ball

为了获得陶瓷球超光滑加工表面,提出一种新型的球体双平面抛光方法,通过使球体在上、下软质抛光盘面之间不断的自旋和滚动实现球面均匀抛光。通过建立球体运动模型和使用Matlab仿真软件对陶瓷球双平面抛光方法进行优化分析,研究表明影响球面轨迹均匀性的球体自转角变化范围和自转角速度的变化主要由行星轮保持架与抛光盘的转速比m、保持架中心到抛光盘中心的偏心距与球体球心到保持架中心的孔心距比n决定。同时使用双平面抛光设备对氮化硅陶瓷球进行抛光20h,表面粗糙度从15.95nm下降到3.90nm,球上各点粗糙度值相差1nm左右,证明了陶瓷球双平面抛光方法的有效性。

In order to obtain ultra smooth surface machining of ceramic balls, a new ball polishing method of dual-plane planetary ball polishing method is presented, the material is removed by the ball spinning and roiling continuously between the upper and lower soft polishing pad. Optimization analysis of this processing method was studied by the establishment of the ball motion model and Matlab simulation, the result showed that the self-spin angle variation range and self-spin angular velocity which impact the trajectory uniformity were related to the speed ratio between the planet wheel holder and the polishing plate, and the distance ratio between the eccentricity of the holder and hold centre distance. Experiment of polishing Si5N4 ceramics ball was operated in dual- plane planetary polishing machine, perfect polishing surface could be obtained under the proper process parameters, the surface roughness reduced from 15.95nm to 3.90nm, and the difference between the value of each measuring point was around lnm after polishing 20h,which proved the feasibility of dual-plane process method for finishing ceramics ball.