期刊文献+

焙烧温度对铈基稀土抛光粉抛光性能影响的研究 被引量:3

A Study of the Impact of Roasting Temperature on the Performance of Ce-based Rare Earth Polishing Powder
下载PDF
导出
摘要 以混合碳酸镧铈为原料,经过HF氟化、过滤、干燥,得到抛光粉前驱体,通过DT-TGA对其分解过程进行研究。在600℃-1000℃条件将前驱体焙烧5h,制备出含氟铈基稀土抛光粉。通过研究焙烧温度对抛光粉晶体结构、抛光能力及抛光后玻璃表面光洁度的影响,发现焙烧温度越高,抛光能力越强;焙烧温度超过950℃,玻璃表面划痕急剧增多。 Taking the mixed lanthanum cerium carbonate as raw materials and the polishing powder obtained after HF-fluorinating,filtering and drying as the precursor,this research observes the decomposition process of the precursor through DT-TGA. Then the precursor is calcined at 600℃ to 1000℃ for 5h and the cerium based and fluorine contained polishing powder is prepared. After studying the effect of the calcination temperature on crystal structure of the polishing powder,its polishing ability,and its surface fineness after polishing,this research finds that the higher the calcination temperature is,the stronger the polishing ability becomes,and the glass surface scratches sharply increase when the calcination temperature exceeds 950 ℃.
作者 杨来东
出处 《陇东学院学报》 2016年第1期40-43,共4页 Journal of Longdong University
关键词 铈基稀土抛光粉 焙烧温度 抛光 表面光洁度 Ce-based rare earth polishing powder calcination temperature polishing surface smoothness
  • 相关文献

参考文献9

二级参考文献25

  • 1王学正.稀土抛光粉的制取[J].有色金属与稀土应用,1994(4):34-37. 被引量:5
  • 2姜中宏.用于激光核聚变的玻璃[J].中国激光,2006,33(9):1265-1276. 被引量:23
  • 3稀土.郑武成[M].北京:冶金工业出版社,1981.46-51.
  • 4稀土.徐兴宪[M].北京:冶金工业出版社,1995.63-66.
  • 5J. H. Campbell, R. A. Hawley-Fedder, C. J. Stolz et al.. NIF optical materials and fabrication technologies: An overview[C]. SPIE, 2004, 5341..81-101.
  • 6W. howard Lowdermilk, David Milam. Laser-Induced Surface and Coating Damage[J]. IEEE Journal of Quantum Electronics, 1981, QN-17(9) :1988-1903.
  • 7H.卡恰洛夫.平板玻璃研磨抛光工艺学[M].毛文杰杨映芳译.北京:中国工业出版社,1965.84-225.
  • 8M.J. Cumbo, D. Fairhurs, S. D. Jacobs et al.. Slurry particle size evolution during the polishing of optical glass[J]. Applied Optics, 1995, 34(19) : 3743-3755.
  • 9C. Wang, P. Sherman, A. Chandra et al.. Pad surface roughness and slurry particle size distribution effects on material removal rate in chemical mechanical planarization [J]. CIRP Annals-Manufacturing Technology, 2005, 54(1) : 309-312.
  • 10G. Bahar Basim, Brij M. Moudgii. Effect of soft agglomerates on CMP slurry performance[J]. Journal of Colloid and Interface Science, 2002, 256:137-142.

共引文献72

同被引文献20

引证文献3

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部