退火处理对MgO薄膜性能的影响

Effects of Annealing Treatment on the Properties of MgO Thin Films

采用磁控溅射法在石英衬底上制备了MgO薄膜并分别在不同温度下进行退火处理。利用X射线衍射仪(XRD)和扫描电子显微镜(SEM)研究了MgO薄膜的结构和表面形貌随退火温度的变化,发现退火可以改善薄膜的结晶质量,即随着退火温度的升高,晶粒尺寸逐渐增大,结晶性能更佳,表面更加平整。此外,通过紫外-可见光分光光度计研究了MgO薄膜光学特性的变化,发现随着薄膜退火温度的升高,可见光透射率下降,光学带隙值逐渐减小。

MgO thin films with（200）orientation were prepared by magnetron sputtering on the quartz substrates and were annealed at different temperatures.The structure and surface morphology were studied by X-ray diffraction（XRD）and scanning electron microscopy（SEM）.The results showed that annealing can improve the crystalline quality of the film.As the annealing temperature increased,the grain size increased,the crystallization properties became better,and the surface became more smooth.The optical properties were also studied by using UV visible spectrophotometer.The results showed that with the film annealing temperature increasing,the visible light transmittance decreased gradually,together with the optical band gap value decreased.