摘要
研究了退火温度对中频交流反应磁控溅射技术制备的TiO2 薄膜结构和表面形貌的影响。利用X射线衍射仪和原子力显微镜 ,检测了TiO2 薄膜的晶体结构和表面形貌。实验结果显示 :沉积态TiO2 薄膜为非晶态 ;低温 (70 0℃以下 )退火后 ,TiO2 薄膜出现锐钛矿相 ,晶粒长大不明显 ;高温退火 (90 0℃以上 )后 ,薄膜转变为金红石相 ,晶粒由柱状转变为棱状 。
The influence of the annealing temperature on the micro-structure and surface morphology of TiO2 thin film prepared by midfrequency alternative magnetron sputtering technique has been studied. The micro-structures and surface morphology were examined by XRD and AFM. The results showed that the TiO2 thin film sputtered at room temperature is amporphous. After annealing at lower temperatures (lower than 700 °C), anatase phase appeared in TiO2 thin film; the grain size of TiO2 changed a little. After annealing at higher temperatures (higher than 900°C), the structure of TiO2 thin film changed into rutile completely; the TiO2 changed from column to nubbly.
出处
《真空科学与技术》
EI
CSCD
北大核心
2002年第4期247-251,共5页
Vacuum Science and Technology
基金
清华大学机械工程学院基础研究基金资助项目
