中能高浓度氦离子注入对钨微观结构的影响

Microstructure of medium energy and high density helium ion implanted tungsten

采用15 keV,剂量1×10^(17)/cm^2,温度为600?C氦离子注入钨,分别以块体钨研究氦离子对钨的表面损伤;以超薄的钨透射电镜样品直接注入氦离子,研究该条件下钨的微观结构变化,以了解氦离子与钨的相互作用过程;采用扫描电子显微镜、聚焦离子束扫描显微镜、透射电子显微镜、高分辨透射电子显微镜等分析手段研究氦离子注入对钨表面显微结构的影响及氦泡在钨微观结构演化中的作用.

Bulk tungsten and tungsten transmission electron microscopy（TEM） lamella are implanted with 15 keV helium ions at about 873 K to study the microstructure evolution. The samples are implanted to about 1 × 10^（17）He~＋/cm^2.The projected range of the helium ion in tungsten is about 43.9 nm, calculated with the stopping and range of ions in matter program（the SRIM code）. The density of pores with diameters ranging from 90 nm to 430 nm is detected on the surface of helium implanted bulk tungsten by field emission scanning electron microscopy. Blistering is also observed on the surface of helium implanted bulk tungsten. The TEM results indicate that fuzz microstructure is formed in helium implanted tungsten TEM lamella, and stacking faults and micro-pores are observed in the fuzz structure. Besides, the density of nano-scaled helium bubbles is detected around the mirco-pores.