摘要
提出了应用0.13μm CMOS工艺设计的具有高隔离度的Ka波段单刀双掷(Single Pole Double Throw,SPDT)开关。测试结果显示,在Ka波段此单片开关插损为2.7~3.7 d B,在35 GHz时测得的输入1dB压缩点(P_(-1dB))为8d Bm。通过使用并联NMOS晶体管的拓扑结构并且使用高Q值的匹配网络,测得的开关在30~45 GHz有33~51 d B的隔离度。此Ka波段单刀双掷开关芯片的核心面积(die)仅仅为160×180μm2。
This paper presents a Ka-band high isolation SPDT(Single Pole Double Throw) switch using 0. 13 μm CMOS process. The switch has a measured insertion loss of 2. 7- 3. 7 d B and an input 1 dB compression power( P_(1dB)) of 8 d Bm at 35 GHz. Via using the shunt NMOS topology and high quality factor match networks, 33 ~ 51 dB measured isolation is obtained within the frequency range of 30 ~ 45 GHz. The switch core occupies only 160 × 180 μm2chip area.
出处
《电子技术应用》
北大核心
2016年第4期43-45,52,共4页
Application of Electronic Technique