Cr^(3+)镀液的双向脉冲电沉积特性

Reverse Pulsed Electrodeposition of Chromium Coating from Cr^(3+) Bath

采用双向脉冲电沉积法从Cr^(3+)镀液中电沉积出铬镀层,并利用扫描电子显微镜(SEM)研究脉冲参数对铬镀层的微观形貌影响的规律,分析脉冲波形参数与Cr^(3+)镀液阴极电流效率之间的相关性,就双向脉冲电沉积与直流电沉积过程中所得铬镀层的微观形貌、Cr^(3+)镀液的阴极电流效率进行分析、比较。结果表明:平均电流密度、逆向脉冲系数、脉冲频率、以及占空比均对铬镀层的微观形貌及电流效率有较大影响;采用双向脉冲电沉积法制备出的铬镀层具有表面平整、结晶细致、粗糙度良好的特点,且具有较高的阴极电流效率。

The electrodeposition of chromium coating deposited from Cr^（3＋）bath was investigated by means of pulse-plating technique with square wave current containing reverse pulse. The surface morphologies of chromium deposits were examined using scanning electron microscope（ SEM）. The relationships between current efficiency and pulse parameters were explored. Results show that the average current density,reverse current,frequency,and duty ratio have great impacts on the microstructure of the coating and current efficiency. Compared with the direct current（ DC） plating,the grain size and surface appearance of chromium deposits are improved significantly by reverse pulsed electrodeposition.