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Characteristics and analysis of 4H-SiC PiN diodes with a carbon-implanted drift layer 被引量:1

Characteristics and analysis of 4H-SiC PiN diodes with a carbon-implanted drift layer
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摘要 The characteristics of 4H-SiC PiN diodes with a carbon-implanted drift layer was investigated and the reason of characteristics improvement was analyzed. The forward voltage drops of the diodes with carbonimplanted drift layer were around 3.3 V, which is lower than that of devices without carbon implantation, the specific-on resistance was decreased from 9.35 to 4.38 mΩcm^2 at 100 A/cm^2, and the reverse leakage current was also decreased. The influence of carbon incorporation in the Si C crystalline grids was studied by using deep-level transient spectroscopy(DLTS). The DLTS spectra revealed that the Z_(1/2) traps, which were regarded as the main lifetime limiting defects, were dramatically reduced. It is proposed that the reduction of Z_(1/2) traps can achieve longer carrier lifetime in the drift layer, which is beneficial to the performance of bipolar devices. The characteristics of 4H-SiC PiN diodes with a carbon-implanted drift layer was investigated and the reason of characteristics improvement was analyzed. The forward voltage drops of the diodes with carbonimplanted drift layer were around 3.3 V, which is lower than that of devices without carbon implantation, the specific-on resistance was decreased from 9.35 to 4.38 mΩcm^2 at 100 A/cm^2, and the reverse leakage current was also decreased. The influence of carbon incorporation in the Si C crystalline grids was studied by using deep-level transient spectroscopy(DLTS). The DLTS spectra revealed that the Z_(1/2) traps, which were regarded as the main lifetime limiting defects, were dramatically reduced. It is proposed that the reduction of Z_(1/2) traps can achieve longer carrier lifetime in the drift layer, which is beneficial to the performance of bipolar devices.
出处 《Journal of Semiconductors》 EI CAS CSCD 2016年第4期77-81,共5页 半导体学报(英文版)
基金 Project supported by the Opening Project of Key Laboratory of Microelectronics Devices & Integrated Technology,Institute of Microelectronics,Chinese Academy of Sciences
关键词 4H-SiC carbon-implanted drift layer PiN diodes Z_(1/2) defects 4H-SiC carbon-implanted drift layer PiN diodes Z_(1/2) defects
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