摘要
在HNO3-HF制绒体系中加入添加剂,对硅片进行制绒,并对制绒后的硅片进行了表面形貌分析和光学性能表征。腐蚀深度结果显示,不同种类的添加剂对腐蚀速率作用不同;硅片表面反射率测试结果显示,所用添加剂对改善制绒后表面光学均匀性有积极作用。通过对添加剂组分配方的优化,在不改变制绒工艺条件的基础上制得腐蚀深度3.5~4.5μm、表面反射率20%~21%的多晶硅片,有望使现有产线制绒效果得到改善。
The silicon wafer has been textured by the HNO3-HF system with additives. The surface appearance and optical characterization of the silicon wafer are analyzed. The corrosion depth results show that different kinds of additives have different effects on the corrosion rate. The silicon surface reflectivity test results show that the additive has a positive effect on improving the optical homogeneity of the textured surface. By optimizing additive formulation, the polycrystalline silicon wafers with 3.5~4.5 μm corrosion depth and 20% to 21% surface reflectivity are prepared.It is expected to improve the texturing process of existing solarcell production line.
出处
《电工材料》
CAS
2016年第2期3-6,共4页
Electrical Engineering Materials
基金
上海市科学技术委员会科研计划项目"环保型光伏功能材料关键技术及其应用研究"(14521103100)
关键词
多晶硅绒面
腐蚀深度
表面特征
反射率
textured polycrystalline silicon
etching depth
surface characterization
reflectivity
