激光直写多层光刻样品定位准确度的研究

Research on Locating Accuracy of Laser Direct Writing Multilayer Lithography

利用磁控溅射法制备了铁钴合金薄膜,并采用电感耦合等离子体发射光谱仪、多晶X射线衍射仪和场发射扫描电子显微镜对沉积薄膜的成分、晶体结构和微观形貌进行了测试和分析。针对DWL66FS型激光直写仪自带定位工具定位销使用时的缺点,设计了"L"形样品定位工具L夹尺。利用高倍光学显微镜对比分析研究了两种定位技术在激光直写多层光刻铁钴合金薄膜时定位的准确度。结果发现,使用L夹尺对多层光刻样品定位的准确度明显优于仪器自带的定位销。

Locating accuracy of samples is an important influence factor of laser direct writing multilayer lithography technique. In this work,the iron cobalt alloy thin films with thickness of 200 nm were prepared on Si（111） substrates by radio-frequency（ RF） magnetron sputtering at room temperature. Composition,structure and morphology of the asdeposited permalloy thin films were characterized by inductively coupled plasma-optical emission spectroscopy（ ICPOES）,X-ray diffraction（ XRD） and field emission scanning electron microscopy（ FESEM）. In view of the disadvantages of the positioning pin,we invented the ＂ L ＂ shaped sample positioning tool——L clamp ruler. The locating accuracy of two different positioning technologies was investigated respectively by using high magnification optical microscope in laser direct write multilayer lithography iron cobalt alloy thin film samples. The experimental results showed that the positioning accuracy of the L clamp ruler was significantly higher than that of the positioning pin.The invention of the L clamp ruler solves the inaccurate positioning of positioning pin in laser direct write multilayer lithography.