一种用于半导体厂房的洁净室技术领域

A New Configuration in Cleanroom for Control of Chemical Contamination for Semi-Conductor Industry

随着半导体厂房对环境要求越来越高,尤其是高端半导体产品对腐蚀性气体的含量要求越来越高,现有的洁净室技术并不能满足这些高端半导体的生产厂房(如32 nm/28 nm高端制程)的洁净要求。因此,开发一种低成本的洁净室,并能避免腐蚀性气体影响,对于一些高端半导体的生产厂房具有积极的显示意义。

With the semiconductor plant to environmental requirements more and more high,especially high-end semiconductor products of corrosive gas content requirements much higher,the existing cleanroom technology does not meet these high-end semiconductor production plant,such as 32 nm / 28 nm high-end process cleanliness requirements.Therefore,the development of a low cost of clean room,and can avoid the impact of corrosive gases,for some of the high end of the production plant has a positive significance of the plant.