Level Set方法在Z切石英各向异性湿法刻蚀模拟中的应用

Application of Level Set method in 3-D micro-structure simulation of Z-cut quartz after anisotropic wet etching

石英是MEMS元器件的重要基底材料,其各向异性湿法刻蚀过程极为复杂。Level Set方法作为一种隐式追踪运动界面的方法,可用于追踪复杂运动界面。详细说明了Level Set方法在石英各向异性湿法刻蚀模拟中的应用过程,包括构建函数、控制方程、数值解法和重新初始化。通过Z切石英凹槽、凸台刻蚀形貌SEM图和模拟结果的对比,表明基于Level Set方法开发的石英湿法刻蚀三维形貌模拟程序是稳定有效的。

Quartz is an important for MEMS and its anisotropic wet substrat etching e material process 1S quite complex. As an implicit-expression mathematical approach for the capture of dynamic surface, the Level Set （LS） method can be used to track complex motions. The application process of LS method simulation of quartz is introduc in ed 3-D micro-structure in detail, including building LS function and control equation, numerical solution and reinitialization. Then, the simulation results of 3-D micro-structures of the mesas and cavities of Z-cut quartz after anisotropic wet etching are compared with the SEM pictures, and the results verify that the developed simulation program is stable and effective