摘要
采用赫尔槽试验、化学分析等方法研究了影响BSC12型三价铬镀硬铬工艺的阴极电流效率、沉积速率、走位能力以及覆盖能力的因素。结果表明,镀液p H为2.0左右时走位效果最好,工作温度为30~50°C之间可以获得30%以上的电流效率。该工艺的沉积速率一般在1μm/min以上。
The factors affecting the cathodic current efficiency, deposition rate, throwing power and covering power of BSC12-type trivalent hard chromium plating bath were studied by Hull cell test and chemical analysis methods. The results showed that the bath has the best throwing power at p H ca.2.0. The current efficiency is at least 30% when plating at 30-50 °C. The chromium deposition rate is generally higher than 1 μm/min.
出处
《电镀与涂饰》
CAS
CSCD
北大核心
2016年第8期398-401,共4页
Electroplating & Finishing
关键词
三价铬电镀
硬铬
电流效率
沉积速率
分散能力
覆盖能力
trivalent chromium plating
hard chromium
current efficiency
deposition rate
throwing power
covering power
