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三价铬硬铬电镀及镀层性能表征 被引量:7

Trivalent chromium hard chromium plating and coating property characterization
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摘要 采用BSC12型三价铬镀硬铬工作液(含三价铬28 g/L、复合配位剂35 g/L、缓冲剂120 g/L和催化剂20 g/L左右)在45钢和42Cr Mo钢棒材上进行了试验。采用金相显微镜、扫描电镜、能谱仪和显微硬度计考察了镀层的金相结构、微观形貌、元素组成、厚度和显微硬度。结果表明,该工艺镀速可达到1μm/min,所得铬镀层为纯金属铬,厚度可超过60μm,显微硬度900 HV以上。 A BSC12-type trivalent hard chromium plating bath composed of Cr(III) 28 g/L, composite complexing agent 35 g/L, buffering agent 120 g/L, and accelerating agent ca.20 g/L was tested on 45 and 42 Cr Mo steel. The metallographic structure, microscopic morphology, elemental composition, thickness and microhardness of the coating were examined by metalloscope, scanning electron microscope, energy-dispersive spectroscope and microhardness tester. The results showed that the process features a chromium deposition rate up to 1 μm/min and is able to produce pure chromium coatings thicker than 60 μm with a microhardness higher than 900 HV.
出处 《电镀与涂饰》 CAS CSCD 北大核心 2016年第7期362-365,共4页 Electroplating & Finishing
关键词 三价铬电镀 硬铬 厚度 显微硬度 trivalent chromium electroplating hard chromium thickness microhardness
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  • 1李家柱,林安,甘复兴.取代重污染六价铬电镀的技术及应用[J].电镀与涂饰,2004,23(5):30-33. 被引量:38
  • 2王先友.三价铬电镀工艺与机理的研究.第五届电镀年会论文集[M].合肥,1997.21-23.
  • 3屠振密 杨哲龙 等.对几种三价铬电镀液性能的初步探讨[J].兵工学报,1982,4(64):37-42.
  • 4屠振密.三价铬镀铬的国内外研究与发展.哈尔滨工业大学学报,1980,(1):109-109.
  • 5EI-Sharif M, Chisholim C V. Electrodeposition of thick chromium coating from an environmentally acceptable chromium (Ⅲ) glycine complex.Trans IMF, 1999,77(4) : 139 - 144.
  • 6李长盈 官大清 宋品升.减少电镀废水排放和回收金属的设备和工艺研究[A]..电镀行业清洁生产研讨会论文集[C].北京,2002.214.
  • 7李家柱 林安.取代重污染六价铬电镀的三价铬电镀研究进展,电镀行业清洁生产研讨会论文集[C].北京,2002..
  • 8El-Sharif M, Chisholim C V. Electrodeposition of Thick Chromium Coating From An Environmentally Acceptable Chromium(III) Glycine Complex[J]. Trans IMF, 1999,77(4):139-144.
  • 9El-Sharif M. Electrodeposition Acceptable Process from Electrodeposition of Hard Chromium(Ⅲ) electrolyte[J]. Trans IMF, 1999,77(4):139-144.
  • 10Zenmi Tu, Zhelong Yang. Cathode Polarization in Trivalent Chromium Plating[J]. Plating and Surface Finishing, 1993, 79(9):78.

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