摘要
Y2002-63234-325 0302841低 K 电介质的电子束处理及设备=Advanced EB-cureprocess and equipment for low-K dielectric[会,英]/On-ishi,T.& Nagaseki,K.//2001 IEEE InternationalSymposium on Semiconductor Manufacturing.—325～328(E)Y2002-63239-163 0302842多晶硅表面微加工 MEMS 结构制备=Fabrication ofpolysilicon surface micromachined MEMS structures[会,英]/Munger,K.& Fuller,L.F.//2001 IEEE Uni-versity/Government/Industry Microelectronics Sympo-sium.—163～166(E)
出处
《电子科技文摘》
2003年第2期22-26,共5页
Sci.& Tech.Abstract
