摘要
引入Taguchi方法分析并优化一种带外延层的PPD结构(EPPD),并通过SILVACO软件进行验证。实验结果显示该方法通过对EPPD像素结构工艺参数的优化,提升了该结构抑制噪声的能力和光电转换性能。
Taguchi method was adopted to analyze and optimize a pinned photodiode with epitaxial PPD structure（EPPD）,and then it was simulated with SILVACO software.The experimental results show that this method is able to reduce the noise and improve the photoelectric conversion of EPPD by optimizing the process parameters.
出处
《半导体光电》
CAS
北大核心
2016年第2期193-196,共4页
Semiconductor Optoelectronics
基金
深圳市科技计划基础研究基金项目(JCYJ20140418095735603)
