基于UV/H_2O_2和UV/PS工艺降解水体中磺胺吡啶研究

Degradation of sulfapyridine in aqueous solution by UV/H_2O_2 and UV/PS technology

采用高级氧化技术-紫外/双氧水(UV/H_2O_2)和紫外/过硫酸盐(UV/PS)工艺降解磺胺吡啶(SPY)。研究表明,紫外与氧化剂(H_2O_2、PS)联用可显著提高去除率,其反应符合拟一级动力学模型。目标污染物磺胺吡啶的去除率在一定浓度内随着氧化剂H_2O_2和PS浓度升高而升高;磺胺吡啶初始浓度越大,反应速率越小;UV/H_2O_2工艺降解磺胺吡啶最大去除率发生在p H=3,而UV/PS工艺降解SPY在p H=11时去除率最大;Na Cl会抑制UV/H_2O_2和UV/PS工艺对目标污染物的降解,而适当的Na HCO_3可促进降解反应的进行;腐植酸对UV/PS工艺产生抑制作用,低浓度腐植酸(≤1 mmol/L)对UV/H_2O_2工艺则有促进作用。

Using the advanced oxidation of technologies-ultraviolet/hydrogen peroxide and ultraviolet/persulfate technology degrade sulfapyridine. Research shows that it could improve the removal rate when adding oxidizers H_2O_2 and PS,and degradation process conform pseudo-first-order kinetics model. Within a certain concentration of oxidizers H_2O_2 and PS,removal rate of target pollutant would improve when the oxidant concentration increasing. The reaction rate decreased with target pollutant＇s initial concentration increasing. The maximum removal rate when UV/H_2O_2 technology degradate sulfapyridine in the conditions p H = 3,as for UV/PS technology,removal rate of degradating sulfapyridine becomes highest when p H = 11. Na Cl has inhibiting effect on both UV/H_2O_2 and UV/PS technology,but appropriate Na HCO_3 has acceleration effect on it. Humic acids could produce inhibiting effect on UV/PS technology,but low concentration humic acids（ ≤1 mmol/L） has improve interaction for UV/H_2O_2 technology.