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925银基底镀覆Ti/DLC薄膜工艺试验 被引量:1

Analysis of Ti/DLC Thin-film Deposited on 925 Silver Alloy Substrate
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摘要 针对925银传统着黑色工艺存在的缺点,采用溅射镀膜与阳极层离子源相结合的镀膜工艺,在925银基底上镀覆Ti/DLC膜,检测了不同工艺参数下膜层的性能。结果表明,通过调整负偏压、工作气体分压及镀膜时间等工艺参数,可以使Ti/DLC膜层获得较纯正、有光泽的暗黑色,并可调节其显微硬度及临界划痕载荷;当负偏压为-120V、Ar气分压为0.40Pa、时间为10min时在925银基底上溅射Ti膜,以及负偏压为-180V,乙炔分压在0.25-0.30Pa、时间为40-45min在Ti膜上沉积DLC膜时,Ti/DLC膜层的外观装饰效果、耐蚀性和力学性能等较好。 To the disadvantage of the traditional black coloring,Ti/DLC film was deposited on 925 silver alloy substrate by sputtering coating combined with anode-layer ion source,and the properties of the films under different process parameters were analyzed.The results show that by changing the negative bias,working gas partial pressure and depositing time,the Ti/DLC film can achieve pure and glossy black coating,and its microhardness and critical scratching load can be adjusted.When Ti film is sputtering coated on 925 silver alloy substrate with the negative bias of-120 V,argon partial pressure of 0.40 Pa and depositing time of 10 min,and DLC film is deposited on Ti film with the negative bias of-180 V,C2H2partial pressure of 0.25~0.30 Pa and depositing time of 40~45min,the Ti/DLC film exhibits the relatively desirable comprehensive performances,including the appearance decorative effect,corrosion resistance and mechanical properties.
出处 《特种铸造及有色合金》 CAS CSCD 北大核心 2016年第5期463-466,共4页 Special Casting & Nonferrous Alloys
基金 广东高校珠宝首饰工程技术开发中心建设资助项目(粤教科函[2012]131号)
关键词 925银 溅射镀膜 阳极层离子源 DLC膜 工艺参数 925Silver Alloy Sputtering Coating Anode-layer Ion Source DLC Film Process Parameters
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