基于g-C_3N_4的Z型光催化体系研究进展

Research Progress on g-C_3N_4-Based Z-Scheme Photocatalytic System

导电聚合物型光催化材料g-C_3N_4有着独特的电子结构、稳定的化学性能和显著的可见光催化活性。基于g-C_3N_4的Z型光催化体系(Z-g-C_3N_4)的催化效率高、电子-空穴复合率低而备受关注,在光催化领域展现出了巨大的应用潜力。本文阐述了Z-g-C_3N_4型光催化反应体系的作用机理,综述了Z-g-C_3N_4在光催化领域的研究进展,介绍了Z-g-C_3N_4在产氢、转化CO_2、降解有机物等光催化领域的应用,讨论了pH值、导电介质等因素对Z-g-C_3N_4光催化性能的影响。最后指出了Z-g-C_3N_4光催化体系在研究过程中面临的问题和研究方向。

Graphitic carbon nitride（g-C_3N_4） is a promising photocatalyst because of its low cost,high stability,and visible-light-induced photocatalytic activity.Z-scheme photocatalysts based on g-C_3N_4（Z-g-C_3N_4） have attracted considerable attention because of their lower recombination rate of electron-holes and higher catalytic efficiency.In this review,the reaction mechanism of Z-scheme photocatalysis and the recent progress in Z-gC_3N_4 are introduced and reviewed.The applications of Z-g-C_3N_4,such as water splitting and CO_2 reduction,are presented.The key factors that affect the photocatalytic performance,such as pH and the presence of electron mediators,are discussed.Moreover,the current challenges are described and the future development of Z-gC_3N_4 is forecast.