SrTiO_3薄膜液相沉积技术制备及光催化性能表征

Preparation and Photocatalytic Property Charactrization of SrTiO_3 Thin Film by Liquid Phase Deposition Method

采用液相沉积技术成功制备了SrTiO_3薄膜,并研究其光催化性能。采用偏光显微镜、扫描电镜和X射线衍射分析研究了不同制备条件对SrTiO_3薄膜结构和形貌的影响,以罗丹明B(Rh B)为目标降解物研究SrTiO_3薄膜紫外光催化性能,结果表明:基板表面的Si-OH组群为SrTiO_3薄膜制备提供了积极的贡献作用,并且垂直沉积的基板更有助于提高SrTiO_3薄膜的表面均匀性。沉积制备的SrTiO_3薄膜在基板表面以叶状和丛状交叉方式生长,且在空气中600℃煅烧2 h转化为高纯结晶态。沉积温度为70℃的SrTiO_3薄膜,紫外光照射120 min Rh B降解率达到98%以上。

SrTiO_3 thin film was successfully prepared by liquid phase deposition method,and its photocatalytic property was researched.The influence of different deposition factors on preparation of SrTiO_3 thin film were investigated.The morphology and structure of SrTiO_3 thin film were characterized by polarizing microscope,SEM and XRD.Photocatalytic properties of the samples were evaluated by decolorization of rhodamine B under UV irradiation.The results show that Si-OH groups provide a positive contribution for SrTiO_3 thin film deposition,and substrate deposited upright is propitious to homogeneous growth of SrTiO_3 thin film.The pure SrTiO_3 thin film with well-crystalline was achieved by annealing at600 ℃ for 2 h in air.The successfully prepared thin film with leaf-like and brush-like morphology grew vertically and intercrossed each other on the substrate.The degradation rate of Rh B after 120 min UV irradiation was more than 98% with SrTiO_3 thin film prepared at 70 ℃.