摘要
利用软件Zemax设计一款可用于盖玻片校正的显微物镜,该物镜采用逆向光路设计,无限远校正系统,其放大倍数为40× ,可见光波段,数值孔径为0. 6,校正的盖玻片厚度范围为0-1 . 5 mm,管镜配合能满足Ф2 0 mm视场.从镜头专利库ZEBASE中选择合适的镜头作为初始结构,通过设定合理的优化函数优化该镜头,对最后的结果进行成像指标分析,该款物镜能满足使用要求.
A microscope objective is designed to correct the coverslip by Zemax.The objective is optimized to infinity-corrected system by using the method of inverted optical path with visible wave-band.This objective with numerical aperture of 0.6and magnification of 40 times can meet the field ofФ20 mm with tube lens.The objective can satisfy the application with coverslip thickness variate from 0 mm to 1.5 mm.The appropriate initial structure can get from lens patents of ZEBASE.The system is optimized by setting reasonable optimization operand.It satisfies requirements.
出处
《光学仪器》
2016年第3期233-237,261,共6页
Optical Instruments
关键词
光学设计
盖玻片校正
无限远校正系统
optical design
coverslip correct
infinity-corrected system
