摘要
纳秒激光脉冲烧蚀硅产生的微纳结构具有广泛的应用前景。激光与硅相互作用过程涉及复杂动力学过程,本文利用1064nm、10ns激光脉冲烧蚀硅产生空洞结构,同时利用相爆炸理论对烧蚀形貌进行分析。研究结果表明:相爆炸使得硅材料发生剧烈的去除,在烧蚀中心产生深坑,而烧蚀产物在相爆炸的巨大压力作用下,高速飞溅,在坑外侧沉积。
The micro-structure induced by ns laser pulses has an comprehensive application prospect. The interaction between laser and silicon involve complex dynamics process,the present paper mainly research the hollow structure of Si under 1064 nm,10ns laser pulses,while the ablation morphology is analyzed by Phase explosion theory. The results show： the Si is peeled off by phase explosion acute at the some time,it produces a deep hole appears at ablation center and ablation product splash around under the pressure of phase explosion. Then,deposited outside the deep hole.
出处
《激光杂志》
北大核心
2016年第6期29-32,共4页
Laser Journal
基金
国家自然科学基金青年基金(No.61403123)
高等学校重点科研项目(No.15A510020)
博士青年基金(No.2012012)
关键词
硅
纳秒激光脉冲
相爆炸
电离
激光支持的爆轰波
silicon
ns laser pulse
phase explosion
ionization
laser supported detonation wave（LSDW）
