辉光放电光谱激发源的射频功率驱动及自动控制系统

Radio Frequency Power Supply Automatic Control System for Glow Discharge Optical Emission Source

射频辉光放电原子发射光谱仪(RF GD-OES)的显著优势在于既能分析导体样品,又能直接分析非导体固体样品,在微纳米非金属涂镀层材料的逐层分析领域有着广泛应用。为此,介绍了射频辉光放电光谱激发源采用的射频功率电源及功率匹配器的工作原理,并结合双向可控硅交流调压技术研制了射频电源的计算机自动控制系统,给出了射频输出信号的计算机控制结果。采用本射频功率驱动及自动控制系统,结合自行研制的Grimm型辉光放电激发源,对有机防腐涂层样品进行了溅射激发,溅射效果良好。给出了溅射坑表面形貌图以及显微照片,经实验测得,逐层溅射速率为52.9 nm/s。采用本系统对1Cr18Ni9Ti不锈钢标准样品进行了分析精密度测试,Cr、Cu、Ti、Al元素测试结果相对标准偏差(RSD)均<2.6%。

The advantage of radio frequency（RF） GD-OES is that it can analyze not only conductor sample but also non-conductive solid sample, and it has wide application in nonmetallic micro-nano coating layer by layer analysis. We described the working principle of the RF power supply and power matcher used by GD-OES, put forward the design of computer control system for RF power using silicon controlled rectifier（SCR） AC voltage regulator, and presented the results of computer controlled RF output signal. Organic anti-corrosion coating samples were sputtered using this RF power supply and automatic control system with Grimm-type GD source. The result of sputtering is effective. Moreover,the sputtering crater surface topography and photomicrographs were presented, and the layer--by-layer sputtering rate was 52.9 nm/s according to the actual measurement. 1Cr18Ni9 Ti stainless steel standard samples are analyzed as precision test. The relative standard deviation（RSD） of Cr, Cu, Ti, Al element test results is less than 2.6%.