期刊文献+

Novel homodyne frequency-shifting interference pattern locking system 被引量:5

Novel homodyne frequency-shifting interference pattern locking system
原文传递
导出
摘要 We present a novel homodyne frequency-shifting interference pattern locking system to enhance the exposure contrast of interference lithography and scanning beam interference lithography(SBIL). The novel interference pattern locking system employs a special homodyne redundant phase measurement interferometer(HRPMI) as the sensor and an acousto-opto modulator(AOM) as the actuator. The HRPMI offers the highly accurate value as well as the direction recognition of the interference pattern drift from four quadrature interference signals. The AOM provides a very fine resolution with a high speed for phase modulation. A compact and concise system with a short optical path can be achieved with this new scheme and a small power laser head in tens of microwatts is sufficient for exposure and phase locking, which results in a relatively low-cost system compared with the heterodyne system. More importantly, the accuracy of the system is at a high level as well as having robustness to environmental fluctuation. The experiment results show that the short-time(4 s) accuracy of the system is 0.0481 rad e3σT at present. Moreover, the phase of the interference pattern can also be set arbitrarily to any value with a high accuracy in a relatively large range, which indicates that the system can also be extended to the SBIL application. We present a novel homodyne frequency-shifting interference pattern locking system to enhance the exposure contrast of interference lithography and scanning beam interference lithography(SBIL). The novel interference pattern locking system employs a special homodyne redundant phase measurement interferometer(HRPMI) as the sensor and an acousto-opto modulator(AOM) as the actuator. The HRPMI offers the highly accurate value as well as the direction recognition of the interference pattern drift from four quadrature interference signals. The AOM provides a very fine resolution with a high speed for phase modulation. A compact and concise system with a short optical path can be achieved with this new scheme and a small power laser head in tens of microwatts is sufficient for exposure and phase locking, which results in a relatively low-cost system compared with the heterodyne system. More importantly, the accuracy of the system is at a high level as well as having robustness to environmental fluctuation. The experiment results show that the short-time(4 s) accuracy of the system is 0.0481 rad e3σT at present. Moreover, the phase of the interference pattern can also be set arbitrarily to any value with a high accuracy in a relatively large range, which indicates that the system can also be extended to the SBIL application.
出处 《Chinese Optics Letters》 SCIE EI CAS CSCD 2016年第6期41-46,共6页 中国光学快报(英文版)
基金 supported by the Foundation of the State Key Laboratory of Tribology at China(No.SKLT2014C01) the National Nature Science Foundation of China(No.51475262) the Autonomous Scientific Research Project of Tsinghua University at China(No.20151080363)
关键词 locking lithography drift robustness quadrature interferometer modulator fluctuation actuator redundant locking lithography drift robustness quadrature interferometer modulator fluctuation actuator redundant
  • 相关文献

参考文献10

  • 1M. Schatternburg, C. Chen, P. Everett, J. Ferrera, P. Konkola, and H. Smith, J. Vac. Sci. Technol. B 17, 2692 (1999).
  • 2R. Heilmann, P. Konkola, C. Chen, G. Pati, and M. Schatternburg, J. Vac. Sci. Technol. B 19, 2342 (2001).
  • 3F. Zhu, J. Ma, W. Huang, J. Wang, and C. Zhou, Chin. Opt. Lett. 12, 080501 (2014).
  • 4B. Yu, W. Jia, C. Zhou, H. Cao, and W. Sun, Chin. Opt. Lett. ii, 080501 (2013).
  • 5L. Zeng and L. Li, Opt. Left. 32, 1081 (2007).
  • 6P. Young, P. Priambodo, and T. Maldonado, Appl. Opt 45, 4563 (2006).
  • 7A. Fitzgibbon, M. Pilu, and R. Fisher, IEEE Trans. Pattern Anal. Mach. Intell. 21,476 (1999).
  • 8K. Birch and M. Downs, Metrologia 31, 315 (1994).
  • 9F. Jong, B. Pasch, T. Castenmiller, B. Vleeming, R. Droste, and F. Mast, Proc. SPIE 7274, 727411 (2009).
  • 10D. Ma and L. Zeng, Opt. Lett. 40, 1346 (2015).

同被引文献47

引证文献5

二级引证文献11

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部