纳米结构的倾斜角度沉积及性能优化

The fabrication and optimization of nanostructures using glancing angle deposition

纳米材料发展的关键是纳米结构的制备、形貌调控和性能优化.倾斜角度沉积是以较大的角度(大于75°)倾斜入射沉积薄膜,通过控制沉积参数,得到具有特殊形貌纳米结构的方法,具有适用范围广,操作便捷,制备的薄膜面积大、纯度高、结构规整等特点,是一种理想的制备纳米材料的方法.本文介绍了采用倾斜角度沉积技术制备氧化铪抗反射薄膜和银基表面增强拉曼基底,详细分析了该方法的参数调控对纳米结构的形貌和性能的影响,并指出将倾斜角度沉积与其他先进技术相结合(以原子层沉积为例),可进一步优化纳米结构的性能,提高倾斜角度沉积的使用范围.

Due to the special structures, nanomaterials possess many unique physical and chemical properties compared with their bulk states. The key points of developing nanomaterials are the fabrication, morphological modulation and property optimization of nanostructures. Glancing angle deposition （GLAD） is an effective way to fabricate nanostructures with specific morphologies by preparing nano-films at large deposition angles （〉75°） and controllably adjusting the deposition parameters. The GLAD technique could conveniently fabricate nanostructures with high purity and aligned arrangement in a large scale, which is an ideal method to prepare nanomaterials for various applications.By introducing the successful preparation of hafnia antireflection films and silver-basedsurface-enhanced Raman scattering （SERS） substrates fabricated via GLAD method, the relationship between the deposition parameters and the specific morphologies as well as properties of nanostructureswere investigated in detail. Meanwhile, efforts have been directed to combine GLAD with other advanced methods （e.g., atomic layer deposition） so as to further improve the properties of nanostructures and broad the employment of GLAD. It is believed that the GLAD technique is an efficient and viable way in the fabrication of nanostructures, which has wide potential applications.