基片温度对直流反应磁控溅射法制备氧化钨电致变色材料循环寿命的影响

Influence of Substrate Temperatures on the Cyclic Life of Electrochromic Tungsten Oxide(WO_3) Films Deposited by Reaction DC Magnetron Sputtering

通过选取室温、100℃、200℃三个不同基片温度制度来探讨基片温度对氧化钨薄膜电致变色循环寿命的影响。实验结果表明:当基片温度由室温提高至100℃后,氧化钨薄膜的循环寿命有较大的改善,循环次数由806次提高至3000次。当基片温度由100℃提高至200℃时,循环寿命反而有所衰退,循环次数由3000次减少至1000次。

Influence of substrate temperatures on the cyclic life of electrochromic tungsten oxide films was reseached.The experimental results showed that when the substrate temperature was increased from room temperature to 100 ℃,the cycles times of film increased from 806 times to 3000 times.But when the substrate temperature increased from 100 ℃ to 200 ℃,the cycle times of film reduced from 3000 times to 1000 times.