多弧离子镀工艺参数对氮化钛薄膜结合力的影响研究

Effects of Multi-arc Ion Plating Process Parameters on Binding Force of TiN Film

应用多弧离子镀对4Cr13不锈钢基体沉积TiN薄膜,用WS-2005型附着力自动划痕仪测试薄膜的结合力,研究弧电流、沉积温度和偏压对膜基结合强度的影响。结果表明:随着靶电流、沉积温度和偏压的增大,TiN薄膜与基体的结合力先增大后减小。在其它参数不变时,当弧电流为85、95、105、120 A时,薄膜结合力分别为42、50、75、63N;当沉积温度为150、200、250、300℃时,薄膜的结合力分别为45、45、48、40 N;当偏压为0、200、300、400 V时,薄膜的结合力分别为38、42、58、42 N。本试验膜基结合强度最佳工艺参数为:弧电流105A、沉积温度250℃、偏压300V。

TiN coating was deposited on 4Cr13 stainless steel by multi-are ion plating and the binding force was measured by WS-2005 adhesion automatic scratch tester. The effects of arc current, deposition temperature, bias voltage on the binding strength of coating-substrate were investigated. The results shows that with the increase of target current, deposition temperature and bias voltage, the binding force between TiN film and substrate increases at first and then decreases. When the arc current is 85, 95,105,120 A and other parameters are constant, the binding force is 42, 50, 75, 63 N respectively; when the deposition temperature is 150, 200, 250, 300 ℃, the binding force is 45, 45, 48, 40 N respectively; when the bias voltage is 0, 200, 300, 400 V, the binding force is 38, 42, 58, 42 N respectively. The best process parameters for the binding strength of coating-substrate are arc current of 105 A, deposition temperature of 250 ℃, bias voltage of 300 V.