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Numerical Study on Microwave Scattering by Various Plasma Objects 被引量:2

Numerical Study on Microwave Scattering by Various Plasma Objects
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摘要 The scattering features of microwave(MW) by planar plasma layer, plasma column and plasma-column array under different parameters have been numerically studied by the finitedifference time-domain(FDTD) method. The effects of the plasma frequency and electron collision rate on MW's reflectance, transmittance and absorptance are examined. The results show that for the planar plasma layer, the electron collision plays an important role in MW absorption and the reduction of wave reflection. In the plasma column condition, strong scattering occurs in certain directions. The scattering pattern depends on the plasma frequency, electron collision rate and column radius. A collisional, non-planar shaped plasma object like the plasma-column array can reduce significantly the wave reflection comparing with the planar plasma layer. The scattering features of microwave(MW) by planar plasma layer, plasma column and plasma-column array under different parameters have been numerically studied by the finitedifference time-domain(FDTD) method. The effects of the plasma frequency and electron collision rate on MW's reflectance, transmittance and absorptance are examined. The results show that for the planar plasma layer, the electron collision plays an important role in MW absorption and the reduction of wave reflection. In the plasma column condition, strong scattering occurs in certain directions. The scattering pattern depends on the plasma frequency, electron collision rate and column radius. A collisional, non-planar shaped plasma object like the plasma-column array can reduce significantly the wave reflection comparing with the planar plasma layer.
机构地区 School of Physics
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2016年第8期791-797,共7页 等离子体科学和技术(英文版)
关键词 PLASMA MICROWAVE scattering feature FDTD method plasma, microwave, scattering feature, FDTD method
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  • 1Jazi B, Rahmani Z, Shokri B. 2013, IEEE Transactions on Plasma Science, 41:290.
  • 2Yuan C X, Zhou Z X, Zhang J W, et al. 2011, IEEE Transactions on Plasma Science, 39:1768.
  • 3Tian Y, Han Y P, Ling Y J, et al. 2014, Physics of Plasmas, 21:023301.
  • 4Yang J, Liang C H. 2005, Chinese Journal of Radio Science, 20:321.
  • 5Guo B, Wang X G. 2005, Physics of Plasmas, 12: 084506.
  • 6Guo B, Wang X G, Zhang Y. 2006, Plasma Science and Technology, 8:558.
  • 7Zhang Z T, Zhao J S, Xu X W, et al. 2011, Plasma Science and Technology, 13:279.
  • 8Kim H C, Verboncoeur J P. 2007, Computer Physics Communications, 177:118.
  • 9Liu S B, Mo J J, Yuan N C. 2003, Plasma Science and Technology, 5:1669.
  • 10Jiang Z H, Hu X W, Liu M H, et al. 2007, Plasma Sources Science and Technology, 16:97.

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