高纯钽溅射靶材制备工艺进展

Fabrication Technology Progress of High Purity Tantalum Sputtering Target

目前高纯钽溅射靶材的制备方法,主要为熔炼铸锭法和粉末冶金法,文章对两种方法制备钽靶材性能的特点进行了详述,同时对粉末冶金法制备高纯钽靶材的试验结果进行分析。针对目前国内外生产状况,展望了未来高纯钽溅射靶材的发展方向。

Fabrication technology of high purity tantalum sputtering target materials are reviewed in this paper, mainly for smelting ingot casting and powder metallurgy method, and the performance of the two methods of the preparation of tantalum target material characteristics, and powder metallurgy of high purity tantalum target material prepared by the experimental results are analyzed. Finally this paper briefly introduces the production situation at home and abroad, and prospects the future development direction of high purity tantalum sputtering target materials.