193nm和248nm波长准分子激光对玻璃及聚合物刻蚀特性的比较

Comparison of Etching Characteristics of Polymers and Glass by 193 nm and 248 nm Excimer Laser Radiation

将波长为193 nm的Ar F准分子激光和波长为248 nm的Kr F准分子激光经光学系统分别垂直照射到不同材料的表面,通过改变激光脉冲数目,在大气背景下进行实验,用三维轮廓仪对照射后的样品表面形貌及表面粗糙度进行测试分析。研究了准分子激光与非金属材料相互作用的机理,并对比得到了193、248 nm激光对聚合物材料PMMA(聚甲基丙烯酸甲酯)及HF4光学玻璃的刻蚀特性。结果表明:在激光能量密度为1.5 J/cm2时,波长193 nm激光比波长248 nm激光在刻蚀PMMA时能得到更好的效果,而在刻蚀HF4光学玻璃时却恰好相反。在准分子激光与非金属材料相互作用的过程中,既不是光源的波长越短,刻蚀效果越好,也不是光与物质相互作用中的光化学机理所占的比重越大,刻蚀效果越好;最终刻蚀效果的好坏取决于很多因素。

The surface of different materials were vertically irradiated by ArF excimer laser at wavelength of 193 nm and KrF excimer laser at wavelength of 248 nm. The experiment was completed in air through changing laser pulse number. The treated materials were analyzed with white-light interferometer. The experiment had analyzed the mechanism problems of interaction between excimer lasers and nonmetal materials,done the comparison of 198 nm and 248 nm excimer laser ablation characteristics between polymath methacrylate （PMMA） and HF4 optical glass. The results show with 1.5 J/cm~ laser energy density, 193 nm wavelength excimer laser has more excellent ablation effect on PMMA materials compared with 248 nm wavelength excimer laser,there is a totally opposite result in HF4 optical glass ablation. It doesn＇t means the shorter wavelength we used,the better ablation result we got,neither to the proportion of photochemistry reaction in laser and material interaction process. The final result of ablation decided by many factors.