磁控溅射CrAlCN涂层的结构与性能研究

Structure and properties of CrAlCN COATINGS deposited by medium frequency magnetron sputtering

采用离子化增强磁控溅射设备在硬质合金(YG8)基体表面沉积CrAlCN涂层,通过控制碳靶电流的大小,从而改变涂层中的碳含量。沉积后的涂层进行了纳米硬度、扫描电镜、X射线衍射、电子能谱和洛氏硬度结合力检测。随着碳靶电流的升高,涂层中的碳含量呈线性上升,涂层由晶态逐渐转变为非晶态,当涂层中的碳含量达到某个临界值时,超过临界值的碳以脆性非晶态继续沉积在涂层表面,其硬度低,韧性差,导致涂层的结合力与硬度下降。

The CrAlCN coatings were deposited on the surface of cemented carbide（YG8）by aplasma-enhanced medium frequency reactive magnetron sputtering apparatus in this experiment,the carbon content of CrAlCN coatings was controlled through changing the current of carbon target.To characterize the films,nanoindentation hardness test,scanning electron microscopy（SEM）,X-ray diffraction（XRD）,energy dispersive spectroscopy（EDS）,and rockwell indentation adhesion test were analyzed systematically.As a result,with the increase of the current of the carbon target,the carbon content in the coatings rises linearly,the crystal morphology of the coatings changed from columnar to non-crystal gradually,the adhesion and hardness of the coatings jump down as carbon content reaches a criticality,the reason for that is redundant carbon continued to deposit on the surface of the coatings as brittle amorphous simple substance after it reaches the criticality.